Used SEMITOOL 260F #9229806 for sale

SEMITOOL 260F
Manufacturer
SEMITOOL
Model
260F
ID: 9229806
Wafer Size: 5"
Spin Rinse Dryers (SRD), 5".
SEMITOOL 260F is a fully automated dry etching equipment designed for etching mask/photo-resist layers on semiconductor wafers. The machine allows for the precise control and management of multiple etch parameters for high-performance etching of various materials such as silicon oxide, silicon nitride, polysilicon, and aluminum. 260F is equipped with a spin-etch chuck, which uses non-contact, low-frequency sputtering to etch surfaces with maximum precision. This controlled spinning helps to reduce the occurrence of debris formation while also maintaining a uniform etch profile across the entire wafer surface. In addition, a wafer monitoring system is integrated with the machine to ensure accuracy and repeatability of the etching process. The machine utilizes a dual mass gas delivery unit, consisting of a high-pressure direct injector and a low-pressure injector. The former is used to provide clean, dry etch gases with high-flow rates, while the latter can provide higher concentrations of etch gases, enabling more efficient etches. The dual mass machine is capable of providing various etching processes such as wet etch, deep etch, passivation, and gate etching. In addition, SEMITOOL 260F has integrated tools for process control and optimization, such as process monitoring and automated recipe control. The automated recipe control feature allows for fully customizable recipes, allowing for optimizations of etch parameters to match specific device specifications. The process monitoring feature helps to ensure process repeatability by monitoring critical etching parameters such as temperature, process time, pressure, and gas flow rate. Overall, 260F is an ideal photoresist etching tool for performing high-precision etching of various materials used in semiconductor applications. It provides a robust and repeatable etching process with precise control of multiple etch parameters such as temperature, pressure, gas flow rate, and process time. Its integrated process monitoring and optimization tools provide the necessary tools for ensuring process repeatability and quality.
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