Used SEMITOOL 270-ST #293663744 for sale

SEMITOOL 270-ST is a chemical imaging equipment designed to deposit a light-sensitive photoresist onto the surface of a wafer. The system utilizes a unique approach in order to apply photoresist onto the surface of the wafer in a uniform and controlled manner. The unit utilizes a programmable linear stage to move the wafer beneath its imaging optics. Using a patented "Button Spacing" design, 270-ST evenly disperses a very fine line of photoresist onto the target wafer surface. The machine can be used in a standalone mode or integrated into an SEMI compliant production environment. SEMITOOL 270-ST uses a titratable tool to accurately and consistently apply photoresist. This asset allows for the precise delivery of photoresist to be applied to the wafer in a range of film thicknesses to meet the user's application requirements. The model is compatible with a variety of different photoresist materials, including dedicated epoxy-based systems, and general-purpose silicone-based systems. The equipment features an industry-leading capability to precisely calculate and accurately deliver measurable thickness of photoresist. The system can be adjusted in a range of increments between 0.5μm and 30μm. This level of flexibility allows the unit to meet the requirements of the full range of target applications. The machine is equipped with automated wafer centering and feature recognition systems. These features allow the tool to identify individual features on the wafer, correctly orient the wafer and accurately apply the photoresist onto the desired target areas. 270-ST's advanced misalignment training asset also ensures that the consistency of photoresist deposition is maintained over the entire wafer surface. The model can also be integrated with a suite of custom integration software tools to further increase functionality. The performance of SEMITOOL 270-ST is further enhanced by its safety features. The equipment features integrated safety systems that prevent wafer damage or abrasion, and reduce the potential risk of exposure to harmful chemicals. In conclusion, the highly advanced 270-ST is an industry leading photoresist system designed to deliver precise and uniform delivery of photoresist onto the wafer surface. Using its patented "Button Spacing" technology the unit can apply photoresist in ranges from 0.5μm to 30μm. It features automated wafer centering and recognition systems for precisely delivered and consistent deposition. The machine is also equipped with integrated safety features and a range of custom software tools to further enhance its performance.