Used SEMITOOL 270 #200803 for sale

SEMITOOL 270 Photoresist Equipment combines advanced wet-clean technology with an advanced LCD display to deliver unparalleled performance in the field of photolithography. This system is designed to process incredibly thin layers of photoresist with precise accuracy and uniformity, enabling manufacturers to produce wafers with very fine line widths and feature sizes. 270 unit is built around a wet-clean process, which uses solvents to gently dissolve contaminants from the photoresist layer. This highly efficient machine automatically cleans the substrate between each successive cycle, making sure the photoresist remains stable and uniform throughout the entire operation. The LCD display allows users to view and monitor the exact photoresist thickness levels during the entire process, providing an additional level of control. SEMITOOL 270 also includes a slew of advanced processes such as edge bead removal, etchback and post-exposure bake enhancements. Edge bead removal is especially important when working with the photoresist, as it prevents non-uniformity along the substrate's edges. Etchback is performed to selectively remove unwanted layers from the top of the wafer. Finally, the post-exposure bake phase is used to better bond the photoresists to the substrate, preventing lift-off and other issues. Overall, 270 Photoresist Tool is an excellent choice for any facility looking for an easy, reliable method of lithography processing. This asset provides users with a total control over the photoresist thickness levels, ensuring uniformity and accuracy. With its advanced processes and LCD display, manufacturers are able to produce wafers with very fine line widths and feature sizes. This model is also cost-effective, with a low operational cost and a low upfront cost.