Used SEMITOOL 270 #77035 for sale

SEMITOOL 270 is a photoresist system used in the production of semiconductor devices. It is a dedicated system that uses multiple process modules to provide precision photolithography. It includes a mask aligner, an applicator, a developing station, and a resist stripping station. The mask aligner module provides the ability to control mask-to-wafer relationships and ensure accurate pattern registration. It uses an optical assembly to project image pattern onto a photoresist-coated substrate, resulting in a pattern that accurately corresponds to the design. Additionally, the mask aligner offers step-and-repeat capability, allowing multiple patterns of different shapes and sizes to be placed on a single substrate. The photoresist applicator is used to deliver the photoresist material onto the substrate surface in a uniform layer. It features automated control for uniform film thickness, enhanced throughput, and reduced optical interference. This applicator can also be used to apply several layers of photoresist or to advertise pattern layers with different film thicknesses. 270 includes a developing station which can be used to remove the photoresist from unexposed areas. Its high resolution nozzle is able to provide an accurate and directed chemical etching pattern which can reduce the time taken by the photolithography process. It features a digital pump for high-speed processing and digital pressure control for precise liquid delivery. The developed photoresist can then be etched onto the surface to form the desired pattern. Finally, the resist stripping station is used to remove unexposed photoresist from the substrate. It is effective in providing residue-free removal of negative-tone photoresists with repeatable results. It electron-beam monitored wafer cleaning station ensures that all photoresist is effectively removed from the surface. SEMITOOL 270 provides a complete photoresist system to facilitate the fabrication of semiconductor devices. Its features are designed to offer precise and automated photolithography for the production of these components. Its flexibility and convenience allow for efficient processing of a wide variety of substrate materials.