Used SEMITOOL 270 #9036302 for sale

SEMITOOL 270 is a fully automated photoresist equipment designed for reliable physical vapor deposition (PVD) and etch processes. It provides advanced material deposition capabilities for integrated circuit manufacturing, MEMS, nanotechnology, and thin film deposition. 270 offers state-of-the-art automated control of the physical vapor deposition (PVD), etch, and annealing processes, as well as chemical-mechanical processing (CMP). The system features an advanced RF plasma source, robust robot handling unit, in-situ heating, integrated precursors, and powerful post process diagnostics. SEMITOOL 270 is equipped with a multi-function process chamber, which is capable of providing high material deposition rates in a wide variety of materials such as AL, Cu, TiN and ITO. The integrated robotic handling machine is capable of handling up to 30 wafers at once in both single and multi-turn modes. This makes the tool efficient and provides a high level of process flexibility. 270 is also equipped with a robust RF plasma source, which allows for low-temperature, low-pressure deposition. The process is compatible with aluminum substrates and able to achieve high-quality material layers. This option is ideal for situations where precise control of the deposition processes is necessary. The integrated in-situ heating asset on SEMITOOL 270 allows for precise temperature control during the etch and deposition processes. This model offers uniform temperature distribution, low thermal diffusion, and consistent temperature across the wafer. This feature allows for reproducible processing and improved repeatability in etch and deposition applications. 270 also includes integrated precursors, which provide automated dosing and storage of precursors to the process chamber. This feature reduces the need for manual handling and minimizes waste. The equipment is also equipped with powerful post-process diagnostics, which provide comprehensive analysis of the process results during and after the deposition process. This ensures consistent layer quality throughout the wafer run. In conclusion, SEMITOOL 270 is an advanced photoresist system that offers robust features and capabilities ideal for a variety of applications in integrated circuit manufacturing, MEMS, nanotechnology, and thin film deposition. The unit's multi-function process chamber, integrated robotics, RF plasma source, in-situ heating machine, integrated precursors, and post-process diagnostics all come together to provide reliable, accurate, and uniform results.