Used SEMITOOL 270 #9268578 for sale

SEMITOOL 270 Photoresist Equipment is a precision, cost-effective, multi-functional tool designed to meet the demands of the semiconductor industry. This system enables full control of the photoresist process, from loading of photoresist wafers to developing the photoresist layers and creating intricate circuit patterns. The unit utilizes an advanced technology called MELZER, which enables precise pattern accuracy and high throughput capability. This is achieved through the combination of laser-based imaging, exposure systems, and optional precision mechanical stage. This combination results in unprecedented accuracy and repeatability. The core of 270 Photoresist Machine is the MELZER Laser Module. This module utilizes lasers and optics to expose photoresist layers with high accuracy and precision. This technology is highly flexible and can be customized to accommodate various photoresist materials and wafer sizes. In addition, the tool is equipped with a high-powered light source, enabling quick lithography times and shorter cycle times. SEMITOOL 270 Photoresist Asset is equipped with various automated features and tools to ensure reliable and consistent operation. Automated cleaning systems using wet-dry scrubbing can quickly prepare the exposed photoresist surfaces for development. The model can utilize up to 10 different developer solutions, allowing for flexibility in different types of wafers and applications. Furthermore, the equipment is capable of automatically controlling the developer solution temperature. Additionally, the advanced MELZER Laser Module built into this system allows for predetermined patterns to be exposed onto the wafers, which can be used for alignment and production of intricate circuit patterns. 270 Photoresist Unit is also equipped with various safety features to ensure no damage is done to the photoresist layers. A wide range of optical lenses are available to help reduce exposure and provide more consistent results. These lenses are designed to minimize the amount of light that is reflected back on the wafer to reduce the occurrence of unpatterned edges. Also, the machine is designed to limit the amount of exposure time and prevent any thermal damage to the photoresist layers. Overall, SEMITOOL 270 Photoresist Tool is an excellent tool that can be used to achieve high precision and repeatability in a cost-effective manner. This asset can enable the fabrication of intricate patterns, allowing for increased flexibility and higher levels of functionality. Furthermore, the range of safety features and automated tools help eliminate the possibility of errors and maintain optimal performance. With all of these advantages, 270 Photoresist Model is the ideal choice for anyone in the semiconductor industry.