Used SEMITOOL 270D #9113800 for sale

SEMITOOL 270D is a fully automated photoresist equipment designed for semiconductor fabrication. It is specifically designed to handle up to 300 mm process wafers and is capable of four, five, or eight-process pipelines with programmable parameters. The system is equipped with an advanced PLC controller and auto-configuration feature to ensure precise process control and yield optimization. It also includes a sophisticated CASSETTE® wafer picking transport unit, which positions the wafers more accurately than conventional methods. In addition, the machine provides a clean and non-contaminated environment during wafer processing. 270D is equipped with a state-of-the-art γ-ray beam source image-exposer. It offers a range of exposure parameters including focus, dose, depth of field, size and shape of the device field, and alignment tolerances. The wafer in a dry environment is exposed to actinic radiation to form a desired pattern and image. The image exposure accuracy is within 10 μm pitch, while registration accuracy is 0.3 μm. The tool is also equipped with an on-board Geometry Processing Unit (GPU) to allow advanced lithography scanning and patterning techniques such as sub-resolution features and multi-frequency exposures. The fully automated process asset also includes an advanced process module for cleaning, developing, photo-resist stripping, float-valve chemical delivery, and conditioning. The process chamber provides contaminant-free clean environment and is equipped with sophisticated logging functions for monitoring process recipe parameters. Thickness measurement ex-situ is also facilitated by the real-time in-chamber thickness monitor. Other features include a high flow speed TN film deposition model for the adhesion layer, automated thin film deposition control with integrated surface contamination control, and real-time plasma monitoring. Overall, SEMITOOL 270D photoresist equipment is a reliable and efficient solution for semiconductor manufacturing. It offers superior process consistency and control, while also providing reliable wafer throughput. It is specifically designed to meet the stringent requirements of high-volume production applications in such industries as MEMS, microelectronics, and optoelectronics.