Used SEMITOOL 270F #178372 for sale

Name: SEMITOOL 270F
Brand: SEMITOOL
SKU: 178372
Availability: InStock

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Photoresist

Manufacturer

SEMITOOL

Model

270F

ID: 178372

Table-top Spin Rinse Dryer (SRD) Capable of processing up to 6" wafers "F" model has the class 10 poly, brush motors and the PSC-101 controller Controller Compatability: PCS-101 DI Water Recirculation: YES Motor Seal: Ferrofluidic Motor Type: Brush N2 Heater Capable: YES Resistivity Monitoring Capable: YES Rotor Type: 4 Bolt Static Eliminator Capable: YES Substrate size: 150 mm max. System Configuration: Table Top Single Bowl Specifications: 101 Controller, Digital Polypropylene cabinet Up to 6" process capability Brush motor Teflon DI and N2 lines Color coded pneumatic tubing Bowls to be electropolished Ferrofluidic Seal design 110V ready system 4 Bolt rotor design - No rotors are included DI resistivity monitor option is included Anti Static module option is included DI recirculation option is included Electropolish metal surfaces Spin dryer bowl Nitrogen manifold Mounting brackets Components: Gaskets & O-Rings for D.I. Water Manifold Nitrogen manifold Rear bowl seal Door seal Vibration dampers Color-coded pneumatic tubing Teflon lines for N2 Teflon lines for D.I. DI Nozzles N2 Filter.

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SEMITOOL 270-F is a Fully Automated Photoresist Processing Equipment designed for the most challenging of photolithography processes. 270-F offers the highest level of versatility and performance with its fully automated operation and industry leading process capabilities. With its ability to process both wet and dry photoresists on a variety of substrates, SEMITOOL 270-F is the ideal choice for a wide array of photolithographic applications. 270-F is designed for maximum temperature control with its dual temperature zone and automated heating and cooling capabilities. This ensures consistent development results across multiple processes. Users can also monitor and adjust temperatures with the touch-screen user interface. SEMITOOL 270-F also includes a vacuum desublimator that reduces the concentration of organic compounds such as butyl acetate or methyl ethyl ketone in the exhaust air. 270-F also offers a host of process options that range from simple front to backside photoresist processing, to more advanced applications such as three pass contact aligner and annealing systems. Tape and tray transport systems provide reliable handling of substrates while the unique contact aligner system maintains a films thickness as thin as 2 micrometers. The unit also offers a variety of spin methods such as single, double-sided, and dip-spin for coat and develop processes. SEMITOOL 270-F is designed for use with a variety of organic solvents and can run non-aqueous solutions such as terpenes, toluene, and isopropyl alcohol. These can be used to provide optimal dissolution of photoresists. Safety features such as chamber flushing, chemical fume scrubbers, and exhauster systems aid in venting noxious vapors and minimizing hazardous chemicals in the work area. Overall, 270-F is the perfect solution for anyone looking for a easy-to-use, fully automated photoresist processing machine with robust temperature control and a host of process options. With its reliable substrate handling and safety features, SEMITOOL 270-F is a cost-effective and efficient solution for photolithography processes.