Used SEMITOOL 270S #293811484 for sale

SEMITOOL 270S Photoresist Equipment is a technologically advanced system designed to provide precision and accuracy when etching and patterning silicon wafers. The unit is comprised of two main components: the process chamber, and the generator. The process chamber houses two advanced etch/strip modules: the HM/CMP module and the photoresist peel-off module. Both modules feature patented technology designed to provide superior process control, repeatability, and advanced results. The HM/CMP module provides high-precision, high repeatability etching, deposition, and polishing capabilities. It's comprised of a sophisticated set of components, including a 5-axis wafer carrier, a dual-frequency capacitance pickup sensor, a highly reactive etch gas distribution machine, and an adjustable gas flow/pressure environment. The photoresist peel-off module contains an advanced digital exposure tool, a high-resolution digital focusing asset, an ultraviolet (UV) source, and a thermal heating device. It's designed to provide reliable, accurate exposure and etching capability for surface photoresist and deep-pattern etching. The generator component of SEMITOOL 270-S Photoresist Model is designed to provide high-speed, low-noise voltage that is perfectly suited for wet-chemistry processing with the process chamber. It features a wide range of power supply options, including DC and AC voltages, as well as support for PC-interface control. The equipment's generator is also designed with meticulous shielding, providing superior noise isolation and higher levels of accuracy. Overall, 270S Photoresist System is a reliable, powerful, and precise tool for the etching and patterning of today's most advanced silicon wafers. Its advanced process control, high repeatability, and superior accuracy make it an ideal tool for the most demanding applications.