Used SEMITOOL 280 #101472 for sale

SEMITOOL 280 Photoresist Equipment is a next-generation lithography platform intended for advanced semiconductor device manufacture. This system is designed to provide high-resolution imaging and ultra-accurate resist development, supporting production of state-of-the-art electronic components. 280 uses an electron-beam exposure unit, rather than the traditional optical exposure systems commonly used for resist processing. This allows for more precise control over the resist pattern and resulting device structure, with superior performance when compared with optical systems. Furthermore, the electron-beam exposure machine has a very large dynamic range, allowing it to image features of different sizes across the entire substrate. The electron-beam exposure tool also enables high aspect ratios, as well as sub-µm feature patterning. As a result, the output images are of the highest quality and fidelity. The asset also features an automated resist development model, allowing for reproducible, accurate film thickness and material removal. This capability ensures the desired device features are accurately produced with each pass. SEMITOOL 280 includes a patented spin-on resist coating technology, allowing for fast and uniform coating of the substrate. This allows for accurate and repeatable device feature sizing and placement within the substrate. Furthermore, the equipment is capable of loading and unloading multiple substrates, enabling large-scale production of complex devices. The data handling and control capabilities of 280 are another advantage of the system. Software is provided for integration and control of the unit, as well as for defect detection and correction. This software is used to manage the entire process from image acquisition to resist coating, resist exposure and development, to placement of feature on the substrate. This software allows for adjustment of exposure and development parameters on an as-needed basis in order to optimize each step of the process. Overall, SEMITOOL 280 Photoresist Machine is a powerful and versatile tool intended for high-volume production of advanced semiconductor devices. With its electron-beam exposure tool, automated resist development and data handling capabilities, 280 provides accurate and repeatable resist processing with superior results when compared with traditional optical asset.