Used SEMITOOL 280 #9116704 for sale

SEMITOOL 280
Manufacturer
SEMITOOL
Model
280
ID: 9116704
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SEMITOOL 280 is a photoresist equipment designed for advanced semiconductor applications. It offers tools and technologies for creating wafer masks for lithography and depositing thin films. The system is capable of handling substrates up to 8 inches in diameter and is capable of processing silicon, germanium, and gallium arsenide wafers with the same precision. The unit is composed of two parts: the resist processor and the deposition machine. The resist processor is essentially a spin-coater, de-smearer, and oven — all in one tool — that clean, coat, bake, and strip photoresist from silicon wafers. The resist processor is automated, and integrated with the deposition tool, which provides precise control of the deposition of thin films that are used for structures built on wafer surfaces. 280 is designed for high throughput production while providing unsurpassed uniformity of film thickness. The asset employs advanced motion control techniques to ensure uniform coverage of the wafer. The software used to control the model allows for control of substrate rotation, dopant concentration, plating current, and other parameters that are crucial for precise deposition control. The equipment is built with a range of options, allowing for easy customization for specific applications. It is capable of advanced processes such as e-beam/thermal/optical lithography, atomic layer deposition, clustering, and wet chemistries. In addition, it is backed by integrated offline process control to ensure that all necessary tests and measurements are completed and verified before shipment. SEMITOOL 280 is well suited for high-end semiconductor devices and is a reliable choice for high-volume production. Its automated system allows operators to minimize errors and waste, as it precisely control all aspects of the deposition process. The unit provides optimal wafer processing with consistent results achieved through advanced motion control, ensuring unsurpassed uniformity of film thickness. This makes the machine highly efficient and cost-efficient for use in high-end production.
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