Used SEMITOOL 280F #9105785 for sale

SEMITOOL 280F is a photoresist equipment designed for chemical-mechanical polishing (CMP), wafer planarization, and post-CMP wet etch cleaning processes. The system's advanced features and software provide users with easy operation and consistent process performance. The unit is equipped with a precise, long-life, composite-plunger dispense machine for a variety of photoresist materials. It also features an interlocked door tool for safe maintenance and operation, a calibrated sub-ambient plenum chamber for temperature control of the process, and an on-board computer for point-of-use control and data logging. 280F asset has an ergonomic design for easy-access maintenance and easy tool calibration. The model's modular design allows users to easily expand the configuration to meet changing needs. It also includes standard and field-automated safety measures such as a hazardous material management equipment, a sealed environment to eliminate dust and airborne particles, and a nitrogen-purging capability for enhanced system safety. SEMITOOL 280F offers a wide range of features and options for manual, semi-automated, and fully-automated CMP processes. The unit has a high-efficiency material pump that delivers chemical at a fixed rate, temperature control for material delivery, and adjustable speed belt for precise control of the substrate stack. Further, it supports pre-wet/post-rinse wafer cleanliness operations. The machine also includes an auto-fill station for easy tank filling and a wafer tracking tool to ensure precise wafer handling. 280F asset also offers a market-leading model upgrade option. With the upgrade, users can access enhanced features such as an integrated optical sensor for wafer detection and flow rate control. Additionally, the equipment provides user-friendly graphical user interfaces (GUI), software-based process setup and optimization, and the ability to link multiple units through a controller. In summary, SEMITOOL 280F photoresist system offers users an advanced, ergonomic, and safe design with a wide range of features and options for manual, semi-automated, and fully-automated CMP processes. It has a high-efficiency, precision material pump, temperature control for material delivery, adjustable speed belt for precise substrate movement, and an integrated optical sensor and flow rate control for enhanced unit performance. The machine also provides user-friendly GUI, software-based process setup and optimization, and the ability to link multiple units through a controller.