Used SEMITOOL 280S #9123938 for sale

SEMITOOL 280S Photoresist Equipment is an advanced platform optimized for the high resolution etching and ion beam etching of surfaces at lower temperatures. It offers users a suite of advanced features to improve the performance and accuracy of the processing of high accuracy features. 280S Photoresist System is built on a vacuum processing chamber which is equipped with a Multi-Chamber Resistance Chromatography (MCR) ion-beam deposition unit. This enables the production of exceptionally thin, high-resolution films with a uniform morphological coverage and excellent quality. The MCR is used to ensure the process is stable, repeatable and that the film thickness can be accurately controlled. SEMITOOL 280S is also equipped with a range of software, controllers and drivers to ensure full control of ion beam current and varying ion energies, along with a range of optically-assisted electrode control. This allows for the precise alignment of multi-layer structures and for feature sizes to be accurately etched. The machine has a wide range of temperature and pressure settings, from a low of 1.1 bar and 200°C to a high of 13 mbar and up to 400°C. This allows the tool to operate in a range of different applications, including those which require a higher temperature during etching. 280S also offers minimized particulate generation and oxidation, which can improve the quality of processed surfaces. SEMITOOL 280S benefits from a range of cells designed to help reduce the number of contaminants which can be present in the chamber during etching. This offers users a more reliable cleanroom environment, while allowing greater control over the exposed features. Additionally, the asset is designed with a range of easy-to-use maintenance features, helping to improve serviceability. In conclusion, 280S Photoresist Model is an advanced platform optimized for the high resolution etching and ion beam etching of surfaces at lower temperatures. Its wide range of temperature and pressure settings, MCR ion-beam deposition equipment, optically-assisted electrode control and cells designed to help reduce chamber contamination make it ideal for producing high-quality, accurately etched features.