Used SEMITOOL 4300 #9116706 for sale

SEMITOOL 4300 photoresist equipment is a state-of-the-art platform designed to assist in the production of advanced integrated circuitry. It is a high-throughput, single-wafer process designed to increase the efficiency of the photoresist deposition, support, spin-coating and development of a broad range of substrates. The system provides a range of process options with a highest available temperature of 155°C. It can be used to coat a variety of substrates including wafers of silicon, glass, and plastic. Features of the unit include a 0-1200 RPM spin speed, up to 300 Torr ultimate vacuum pressure, and temperature uniformity +/- 5 °C. The machine has a dual-pocket workflow, with a precoat cycle in the second pocket, allowing for multiple process steps to be performed in a sequential fashion. The state-of-the-art process capability significantly reduces the number of process steps required for precoat processes. It also eliminates the need for inline temperature controllers, eliminating the need for additional process steps during runtime. The chamber of the tool is designed to ensure process repeatability and prevent cross-contamination. It is constructed out of light-weight aluminum for superior temperature preservation and preventative of oxidation during long processing times. 4300 is controlled by a touchpad control panel that offers a variety of process control and process analysis tools. The user friendly interface makes it easy to program and set up the asset for a variety of photoresist processes. SEMITOOL 4300 is a reliable and efficient process for photoresist manufacturing and is an ideal platform for high-throughput industry fabrication applications. Through utilizing the model's process control capabilities, accuracy and consistency of processes are guaranteed, ensuring that products are of the highest quality with consistent product yields. With its user-friendly interface, it is easy to set up, use and maintain.