Used SEMITOOL 4300S #25304 for sale

SEMITOOL 4300S
Manufacturer
SEMITOOL
Model
4300S
ID: 25304
Single stack spin rinser dryer, 8" Roll around configuration Includes: Class 10 Poly 4 bolt or quick Disconnect rotor N2 rear seal.
SEMITOOL 4300S is a photoresist equipment designed for the semiconductor industry. It is a fully automated platform used to accurately and precisely deposit thin-film photoresists on wafers. The Photoresist System (PRS) is a flexible and user-friendly unit which allows for precise and reliable performance. The machine uses an advanced resist imaging unit which uses a multitude of nozzles to enable high-precision, uniform and homogeneous vortex deposition. The vortex jet is agitated to ensure a uniform, consistent droplet size and shape. This ensures precise and repeatable coating of even the most delicate photoresists. The precise and stable deposition rate ensures that the photoresist layer is of a uniform thickness across both the front and back sides of the wafer. The tool features a powerful precision light source with integrated multilayer mask and optics which allow for precise patterning of the photoresist layer. Both hard and soft filters are available to ensure accurate exposure of the photoresist. The patent-pending advanced nozzle design and dynamic air flow technology enable precise and repeatable post exposure bake (PEB), preventing common wafer issues such as sticking and delamination. SEMITOOL 4300 S also comes with an integrated screen analysis asset.This advanced feature allows for efficient screening of the photoresist layer in order to ensure uniform deposition and exposure. The technology incorporates the use of non-invasive scanning on the wafer surfaces enabling detection of small variations in the photoresist layers. 4300S is designed for maximum user flexibility and reliability. This allows for the rapid set-up, cleaning and maintenance of the model, enabling it to handle a wide range of process adjustments and modifications. This advanced photoresist equipment provides an efficient and precise solution to any photoresist deposition process within the semiconductor industry.
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