Used SEMITOOL 4300S #71200 for sale
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ID: 71200
Wafer Size: 12"
Spin rinse dryer, 12"
102 Controller
Digital
Programmable
Non-contact labyrinth rear bowl shaft seal
Static eliminator assembly
Resistivity
RA-10 Bowl finish
Rotor quick disconnect
Brush-less motor with motor controller
Polypropylene cabinet: Aero style
Guaranteed particle counts: < 50 at .3 Micron
Used 17 meg Ohm DI water and class 1 N2.
SEMITOOL 4300S is a photoresist coating and developing equipment which utilizes advanced, specialized technology to achieve the highest resolution and smallest feature size achievable. It is ideally suited for the production of semiconductor devices, particularly those requiring very fine line widths. The system is equipped with two standard vapor deposition chambers, as well as multiple terminals for connecting external devices, such as a downstream bake oven or additional vapor deposition chambers. Up to four additional pods can be added to give the unit a total of six chambers. This allows for a variety of surface sizes to be coated. The machine also has two wafer transport systems with two independent brushless linear motors for precise wafer positioning inside the chambers. The tool utilizes an automated software control asset with a web-based user interface. This allows users to control the model from any internet-connected device, and also enables remote monitoring and control. Furthermore, the equipment features advanced data logging and reporting software, allowing users to extensively analyze each wafer process. ForSubstrate heating, the system includes both pre-placed heating elements and halogen lamps, which allow for precise control of temperature and heating rates. Once a wafer is in the chamber, a photoresist coating is applied using the spin-coating method. A sample substrate is then loaded onto the spinner head and spin-coated with the photoresist. This is followed by a multi-step development process in which the exposed photoresist is removed with a developer or etchant. After development, the remaining photoresist is removed from the substrate with a clean solvent. For increased resolution and smaller feature size, the unit can be used in conjunction with two-step bi-level COBEX processes. This is composed of a first long-term spin-level process optimized for high resolution, followed by a short-term spin-level process for feature miniaturization. In conclusion, SEMITOOL 4300 S is a powerful photoresist coating and developing machine designed to meet the needs of high-end semiconductor device manufacturing. Its advanced feature set and automated control tool provides users with top-of-the-line resolution, miniaturization capabilities, and easy-to-use operation.
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