Used SEMITOOL 4300S #9221068 for sale

SEMITOOL 4300S
Manufacturer
SEMITOOL
Model
4300S
ID: 9221068
Wafer Size: 8"
Spin Rinse Dryer (SRD), 8".
SEMITOOL 4300S is a photoresist processing equipment designed to remove thin films and semiconductor substrates, and to enable the production of integrated circuits (ICs). It is an ideal platform for cost-effective, high-volume, high-precision production. The system consists of a three-axis stepper motor and a directional vacuum wafer load station. The wafer is loaded onto a carrier that is moved by the stepper motor along the x, y, and z axes. The vacuum pump draws the wafer onto the work station, then the motor moves the wafer through the process steps. SEMITOOL 4300 S is equipped with a precision resist film applicator, which uses a programmable spin speed and UHV turbo-pump. This ensures uniform deposition of the photoresist film across the surface of the wafer. The precision of the deposition is further enhanced by a precision post spin-speed control, which optimizes the torque applied to the wafer. An optical metrology unit is used to monitor the deposition of the photoresist film on the substrate. The thickness of the wafer is measured and feedback is given to the applicator to adjust the speed of the rotor according to the desired thickness. The hot plate is adjustable, which allows process variables such as etching time and temperature to be set. The rotor has a cooling machine to ensure uniform temperature during the photoresist process. The tool also includes a waste compartment to collect used photoresist film. 4300S is a versatile asset that can be used for a variety of photoresist process applications. It is reliable and stable, enabling consistent production of high-precision ICs. The model also offers excellent cost-effectiveness, making it a great choice for production line needs.
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