Used SEMITOOL 440 series #84155 for sale

SEMITOOL 440 series
Manufacturer
SEMITOOL
Model
440 series
ID: 84155
rinser/dryers.
SEMITOOL 440 series is a photoresist processing equipment that offers outstanding lithography performance and throughput, combined with reliable precision and repeatability. This system is designed for use with a range of photolithographic applications, such as integrated circuit (IC) production, transistor-level microelectronics, and deposition/etching processes. It features advanced technology, enhanced ergonomics, and intuitive operation for efficient, cost-effective processing. 440 series utilizes a proprietary resist-strip technology to achieve optimal substrate coverage, uniformity, exposure, development and rinsing performance. The active "optical-leveler" unit monitors exposure and development timing to maintain accuracy and repeatability. The machine also includes a dual-quartz-plate exposure chamber and a high-throughput spin processor, which allow for quick and accurate processing. The unique "react-ramp" feature enables faster spins and shorter dwell times, and the advanced nozzle design supports high-rate rinse water jets. The tool also features the patented "sonic-pulse" calibration asset to ensure correct parameters for resist strip operations for different applications. It is equipped with a fully adjustable platform, which allows for quick setup and is backward compatible with existing SEMITOOL systems. The integrated remote processing control enables the operator to remotely diagnose critical model conditions and adjust settings as needed. SEMITOOL 440 series equipment is designed for operation in cleanroom environments. Its superior power distribution system ensures fast and reliable operation, with no performance degradation due to variations in power supply. The unit is also equipped with redundant safety features, including Fused Machinery & Interlock Safety Controls and temperature and humidity sensors. 440 series' superior design and engineering make it an ideal solution for modern photolithography applications. It offers maximum throughput, performance, and reliability, enabling higher precision and repeatability, saving time and money.
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