Used SEMITOOL 440S #9137505 for sale

SEMITOOL 440S is a photoresist equipment designed for high-accuracy and high-throughput mask processing and critical wet-etching operations in semiconductor manufacturing. The system is best suited for use in situations where critical cleanliness and precision processing is needed, such as ultra-fine line definition of advanced technologies. The unit comprises a closed-loop, dual- controller platform architecture that drives two separate pieces of equipment - the mask aligner and the wet processor module. The mask aligner is used to accurately align the photomask features with the substrate during processing while the wet processor module is responsible for the wet etching process. The mask aligner is constructed from an electrostatic bake plate and an adjustable-power UV laser to ensure the precise alignment of the photomask features with the substrate. It can process a wide range of substrates from flat panels to three-dimensional surfaces, and features a substrate size of 10 inches. The bake plate is used to harden the photoresist prior to the photomask exposure process. The wet processor module is responsible for a range of wet-etching operations, including wet etching, oxide etching, vapor etching, cleaning, and priming. It is constructed from a two-stage quartz process chamber and utilizes both chemical and physical processes to achieve desired etching and cleaning results. The machine's automation and control capabilities are based on SEMITOOL Command Software Suite, which provides sophisticated process and alignment control. The software includes features such as real-time exposed-feature- edge monitoring, high-accuracy alignment control, adjustable-power laser control, real-time process monitoring, and online process diagnostics. The tool features self-calibration capabilities that ensure reliable and repeatable performance, as well as a programmable etch process window that allows for custom-designed process recipes. The asset also includes comprehensive safety features such as alarms, door interlocks, and emergency stop buttons to protect both operators and equipment from hazardous conditions. Overall, 440S is an advanced photoresist model specifically designed for high-accuracy and high-throughput mask processing operations. It features an easy-to-use user interface, sophisticated process control capabilities, and self-calibration features that ensure reliable and repeatable performance. This makes it perfect for ultra-fine line definition of advanced technologies in high-cleaning and precision-processing operations.