Used SEMITOOL 460F #151780 for sale

SEMITOOL 460F Photoresist Equipment is a fully automated, front-sided chemical wet station designed to process semiconductor wafers in the production of semiconductor components. The system is designed to provide superior chemical uniformity, flexibility, and accuracy in the photoresist coating process. 460F features an integrated wafer loader and wafer unloader which is capable of handling a wide range of wafer substrates, including 4-inch and 6-inch wafers in both standard and bare-back configurations. The loading and unloading of the wafer is accomplished with a robotic arm to ensure the highest quality results. The unit can be configured to process up to eight wafers per cycle with a loading time that is adjustable from 20 minutes to 6 hours. The machine is designed with precision chemical metrology controls to ensure accurate and uniform coating thickness. The tool is equipped with an advanced chemical dispense controller that monitors and records the dispense rate of every photoresist and chemical dispense. SEMITOOL 460F asset is capable of creating a uniform dispense and coating profile that can be programmed in accordance with pre-determined recipe parameters. 460F model is also equipped with a self-diagnostic test feature and alarm log that allow for easy monitoring and maintenance of the equipment as well as fault detection. Furthermore, the system includes a temperature control unit with a cooling tower to maintain temperature stability within the wafer process chamber and allow for a higher resolution image of the photoresist. SEMITOOL 460F Photoresist Machine is an ideal choice for semiconductor laboratories and research facilities that need a reliable and efficient way to process their wafers. The tool is designed to provide superior chemical uniformity and accurate photoresist coatings while still allowing for easy maintenance and effective diagnostics. 460F asset is the perfect choice for the research labs and production facilities that need a quality solution for their photoresist processing.