Used SEMITOOL 460S #151779 for sale

SEMITOOL 460S Photoresist Equipment is a fully automated chemical mechanical planarization (CMP) system designed to provide chemical/mechanical processing of substrates. It is equipped with precision wafer carriers and automated cleaning, pre-cleaning, CMP, post-cleaning, and drying modules. The user-friendly graphical interface allows for easy process optimization and setup. 460S is equipped with a six-pocket barrel for processing substrates up to 8" in diameter. The CMP heads are suspended with air-bearing cushions, allowing for even pressure distribution across the entire surface of the wafer. The wafer carrier is protected from chemical/substrate interactions by a process enclosure, which is reversed between each step to maintain the highest process consistency. The CMP heads are designed with a removable carbide block to adjust the gap between the wafer and the head. SEMITOOL 460S Photoresist Unit has an adjustable machine control program that enables user-defined scrubbing velocities, pressures, and CMP head speeds. The unit also features a fixed chamber pressure that ranges between 0.3 psi and 0.6 psi, allowing for wafer-to-substrate consistency. The tool is able to measure and monitor process data such as asset pressure, reservoir volume, and pump speed, providing real-time results. The unique dual-dithering cleaning technology ensures the highest quality CMP results and the uniformity of the polishing process. The user-friendly graphical interface allows for easy process planning and optimization. In addition, the model includes an integrated automation controller, a PC software package, and a comprehensive library of downloadable recipes. 460S Photoresist Equipment is designed to reduce operating costs by providing maximum productivity and high-precision CMP results. It is an ideal solution for applications in semiconductor, MEMS, and MEMS-based device manufacturing. The system is capable of processing a wide range of substrates and materials, making it an ideal choice for many high-volume production applications.