Used SEMITOOL 470 series #84150 for sale

SEMITOOL 470 series is a photoresist equipment designed to provide photolithography applications with exceptional process capabilities. This system is capable of handling a variety of substrates and photoresist materials and provides optimal results for all kinds of photolithography requirements. The unit consists of a modular wet processing platform, which can be configured for a wide range of substrates including wafers, pc boards, and discrete components. The machine is equipped with automated tool exchange, a robotic substrate and wafer handler, and an industry-leading software suite allowing for the operation of multiple processing tasks. The tool offers maximum flexibility and scalability, enabling it to meet the specific needs of its users. The asset features a temperature-controlled submersible/resistant cassette station, a temporary processing cassette, and provides for up to two heated to 270° F immersion and spray rinse tanks. The model utilizes advanced semisubmersible/resistant chemical delivery techniques and provides an optional chemical monitoring equipment that ensures proper concentration of chemical solutions. 470 series also offers an advanced photoresist-lifecycle management solution with an integrated barcode scanner. The core process capabilities of the system include pre-bake, pre-coat, post-coating steps, post-rinsing, strip and strip rinse. Additionally, the unit can be supplemented with tooling and accessories to customize processes suited to the needs of specific applications. The machine also provides users with advanced process control and reporting capabilities through its operating software tool, which allows for the monitoring of process variables and the tuning of process parameters. The asset offers a wide range of features and options, ranging from material handling, recipe scripting, and data logging, to productivity control and tracking. Overall, SEMITOOL 470 series Photoresist Model offers an advanced and reliable solution for photolithography applications. Its flexible and scalable design makes it an ideal equipment for a wide range of photolithography requirements, providing users with unparalleled process control and performance.