Used SEMITOOL 470S/L #9099016 for sale

SEMITOOL 470S/L Photoresist Equipment was a reliable and cost effective tool used to process semiconductor wafers in the semiconductor industry. It is a resist processing system series that uses dry and semi-wet processing. The 470S/L is versatile and has the capability to deliver both conventional and specialty wafer processing for a wide range of customer requirements. It was designed for use in both R and D and production environments. The unit provides a number of features which include compatibility with most one-and two-chamber remixing baths, quick and easy wafer handling, and fully automated temperature and spin speed control. The 470S/L is a powerful lithography machine providing film thickness control of up to 1000 nm. Its precision-engineered wafer-holding mechanism enables uniform dispersion of the resist on the wafer surface, and its advanced hotplate technology provides fast, accurate and repeatable wafer-leveling. The temperature of the hotplate is adjustable up to 300 C and provides precise wafer alignment. Additionally, the 470S/L features a top-down spin option for wet etching and spin oven capabilities. The tool allows high productivity throughput with a fast process cycle time ( < 20 sec) and offers the option of using both hotplate and spin bake automation for quicker time to reach a targeted temperature. These features make the asset a good option for low-volume production testing, and many customers found that its fast process time was key for developing quick and accurate process cycles. The model is also extremely reliable, with low maintenance requirements and minimal potential for equipment down time. Its excellence in process control and operation manipulation also reduces costly and time consuming equipment repairs. The 470S/L also features a variety of safety features, such as a liquid waste bin and top-down spin safety. The 470S/L is a valuable tool for semiconductor wafer fabrication and can provide significant cost savings. With its precision engineering and powerful process control options, as well as its high performance and low maintenance requirements, it is suitable not only for high-volume production, but also provides a reliable and cost effective solution for research and development as well.