Used SEMITOOL 470S #178413 for sale
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ID: 178413
Spin rinse dryer, (SRD)
Single Spin Rinser Dryer on a roll around cart
Capable of processing up to 6" wafers
Possible options include: rotors, static eliminator, resistivity monitor and water recirculator
"S" model upgrade includes class 10 Poly, quick disconnect rotor and an N2 rear seal
Controller Compatibility: PCS-101, PCS-102
DI Water Recirc Capable: YES
Motor Seal: Labyrinth
Motor Type: Brushless
N2 Heater Capable: YES
Resistivity Monitoring Capable: YES
Rotor Type: Quick Disconnect
Static Eliminator Capable: YES
Substrate size: 150 mm max.
System Configuration: Roll Around Single Bowl.
SEMITOOL 470S is a photoresist equipment that is used for the fabrication of semiconductor devices within a cleanroom environment. This system is composed of a number of independent components which work together to provide the user with a high-quality, precision environment for the development of semiconductor circuits. At its core, SEMITOOL 470 S features an advanced high-frequency, pulsed electron beam evaporator, which is designed to deposit the finest layer of photoresist onto the material beneath. The evaporator consists of a high-frequency, high-voltage power supply and a large, symmetrical electron beam gun. The co-focused, directed electron beam oscillation technology used by this unit ensures precise resist deposition and ensures that the size of the photoresist line remains consistent. The evaporator also comes with a range of adjustable parameters, such as column position, line width and depth of deposition, enabling the precise application of photoresist. The second component of 470S is the Spin Processor, which controls the precise spinning and spinning parameters of the photoresist deposition. The Spin Processor is equipped with an advanced DSP (Digital Signal Processing) machine, which combines absolute precise process control with precise tracking of distal rotation and acceleration. The processor is pre-programmed with an array of spinning profiles, allowing the user to easily select the most appropriate for their resist thickness and layout requirements. 470 S also includes a Multi-Exposure Processor, which provides an exact and consistent multiple exposure source. This processor provides a range of exposure requirements, from single stripe to complex rectilinear patterning, enabling the fabrication of semiconductor circuit designs with a high degree of accuracy and repeatability. Finally, SEMITOOL 470S features a high-resolution inspection tool, which ensures that the best possible quality and consistency of the deposited photoresist is achieved. This asset features three high-resolution cameras with adjustable zoom lenses, allowing for the inspection of multiple areas simultaneously. The inspection model is also connected to a powerful computer equipment, which ensures that the data captured by the cameras is always accurate and current. SEMITOOL 470 S photoresist system is a truly comprehensive unit which provides the user with a complete solution for the fabrication of semiconductor devices. Its advanced evaporator technology and precise Spin Processor, along with its Multi-Exposure Processor and high-resolution inspection machine reliably deliver the very best in quality, consistency and usability.
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