Used SEMITOOL 470S #293658254 for sale

SEMITOOL 470S is a Photoresist Equipment designed to process semiconductor wafers. It has features of a traditional lithography indexer combined with powerful process controls. This system is designed to optimize semiconductor device processing in a wide range of applications. SEMITOOL 470 S is made up of a substrate handling chamber, multiple process modules, and an easy-to-use user interface. The substrate handling chamber is designed for efficient wafer loading and unloading. It has a high capacity, with a large wafer staging area that allows for quick loading and unloading and an evenly distributed vacuum throughout the chamber. The integrated multiple process modules of 470S are designed for lithography and resist development processes. The unit's features include an advanced stepper controller, dual indexing, repeatable overlay tracking, and a patented pre-aligner. The stepper controller offers independent control of linear and rotary motion for the greatest accuracy in patterning applications. The dual indexing machine facilitates repeatable alignment of the substrate with the patterning slit and stepped fields, while the pre-aligner keeps wafers in perfect registration. 470 S also features resist development capabilities with a dispense nozzle loading tool and a resist strip chamber, both of which are sealed from the outside environment to ensure contamination-free processing. The asset's separate resist layer application chamber can accommodate a wide range of photoresists, allowing for process versatility. The user interface of SEMITOOL 470S is specifically designed to simplify and expedite production operations. The model uses a touchscreen interface with intuitive icons, making navigation and navigation processes easier. The integrated tools are designed for detailed product analysis, allowing users to access detailed data regarding each of their processes. Overall, SEMITOOL 470 S is an ideal photoresist equipment for efficient semiconductor wafer processing. Its innovative design combines the versatility of lithography processes with precise resist development capabilities, along with an easy-to-use user interface.