Used SEMITOOL 480 #78270 for sale

SEMITOOL 480
Manufacturer
SEMITOOL
Model
480
ID: 78270
S-Style Spin rinser dryer bench top (1 bowl system), remanufactured Accommodates up to 8” low profile 102 Controllers, Digital Brushless motor Non-contact labyrinth seal upgrade for motor drive and bowl assembly Rotor Quick Disconnect, for a low profile cassette A192-81M Resistivity Monitor Static Eliminator Assembly Complete Documentation Package Guaranteed Particle counts <50 at .3 micron Polypropylene Cabinet “Aero Style” Electro-polished Bowl 17 meg Ohm DI water and class 1 N2.
SEMITOOL 480 Photoresist Equipment is an automated system providing full-wafer processing and stripping of photoresist patterns with high speed, repeatability and accuracy. The unit uses front-end load robots to transfer wafers between the Pre-clean Station, Hot Plate, Track and Developer Station and Unload Station. The Pre-clean Station is designed to clean the wafer surfaces to remove any pre-existing residues and provide an ideal starting point for resist application. The Hot Plate provides an even temperature across the wafer during pre-bake and post-bake processes, as well as expose the resist pattern. The Track Module is equipped with an advanced microprocessor-based machine that adjusts the platter speed, nozzle size and film thickness on a per-wafer basis. The Developer Station is equipped with an optimized spinner and multi-directional spray nozzles for fast and accurate development of the resist pattern. The Unload Station is designed for precisely positioning the wafer after baking and track processes. The tool is designed to handle wafers up to 8 inches in diameter and process tapes up to 1mm thick. It provides excellent alignment repeatability, corner accuracy, and other critical parameters with maximum consistency. 480 is also easy to program and maintain, and supplies a fault recovery asset in the event of any faults. The model is ideal for semiconductor device applications and is designed to ensure maximum yield and cost efficiency.
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