Used SEMITOOL 480S #9229853 for sale

SEMITOOL 480S is a photoresist equipment used to pattern substrates with photolithography. The system is designed for a high-volume production environment and is capable of meeting the requirements for many advanced integrated circuit (IC) applications. 480S features a high-quality, dual-beam excimer exposure unit. This machine utilizes a range of wavelengths including 248 nm and 193 nm ultra-violet radiation, enabling the user to select the most appropriate exposure parameters for a given photoresist. The unit also includes a built-in robotic arm for precise positioning of the substrate during the exposure process. SEMITOOL 480S is equipped with a low-temperature plasma chamber for post-coat plasma cleaning. This chamber is designed to clean the substrates prior to the application of the photoresist, ensuring a smooth and uniform surface for maximum uniformity of results. During post-coat plasma cleaning, the substrates are exposed to an ionized gas mixture at temperatures lower than those used in conventional etching processes. This allows the chamber to clean the surface of the substrate without causing any damage. 480S is equipped with a high-resolution camera tool for lithographic alignment. This asset uses an array of CCD sensors to allow for a precise and accurate alignment of the substrate to the exposure pattern. The model also uses two-dimensional alignment features to ensure that there is no distortion in the patterning of the substrate. SEMITOOL 480S also includes a spin-etch unit which is used to deposit photoresist onto the substrate. The equipment is capable of depositing photoresist of varying thicknesses, with a maximum thickness of 8.5 micron. After deposition, the substrate is subjected to a post-dry bake process which further enhances the adhesion of the photoresist to the substrate. Finally, 480S can be used for both the pre-baking and post-baking of the substrate. Pre-baking is done to further reduce the surface tension of the substrate which will increase the adhesion of the photoresist and improve the pattern definition. After post-baking, the photoresist pattern can be cured and ready for application. Overall, SEMITOOL 480S is an advanced system that is capable of handling a variety of advanced photoresist processes. Its sophisticated design and the use of high-end technology allows it to provide accurate results with excellent uniformity. This makes it an ideal choice for high-volume production and advanced IC applications.