Used SEMITOOL 8300 #84827 for sale

SEMITOOL 8300 photoresist equipment is a comprehensive alignment and lithography solution used to create micro-sized structures on a substrate. It is highly suitable for advanced semiconductor device manufacturing processes and for electronic materials research. It includes two different pieces of equipment - a Stepper and a Coater/Developer - to accurately align substrates and prepare them for micro-structuring. The Stepper is an optical scanning system designed to scan substrates with precision and accuracy. The stepper utilizes various features to provide a highly accurate alignment unit, such as a stainless steel frame, an indexed plate, and a digital camera. It can accurately image features of 5 microns or smaller and has an extremely fast scan speed to quickly align substrates. The Coater/Developer can be used to apply photoresist to the substrate in order to create micro-structures on it. The coater/developer contains two main parts - a coater and a developer. The coater is used to apply a uniform film of photoresist to the substrate. It consists of a pneumatic pressure nozzle that is able to precisely and uniformly control application. The developer contains mixed-bed Ionic Solutions (MBI) which helps to remove photoresist from the substrate. Additionally, 8300 includes a range of performance enhancing accessories such as an automated indexer, auto-focus stages, temperature control systems, and multi-layer detector systems. All of these accessories allow for greater accuracy and performance from the machine. The tool also contains a number of other features designed to improve process productivity and product quality, such as the ability to utilize Dark Field Imaging technology and advanced edge locating capabilities. SEMITOOL 8300 photoresist asset is a reliable, versatile and modern lithography solution that is ideal for micro-structuring applications. Its advanced features allow for high accuracy and precision processes, while also providing a range of performance enhancement options. This comprehensive type of lithography model is necessary in order to achieve reliable results and produce systems with high yields.