Used SEMITOOL 860F #84179 for sale

SEMITOOL 860F
Manufacturer
SEMITOOL
Model
860F
ID: 84179
Wafer Size: Up to 5"
Spin rinse dryer, up to 5".
SEMITOOL 860F is a photoresist equipment used primarily in the fabrication of semiconductor devices. The system includes a photohead and a custom robotic arm for precise control of mask and substrate placement, allowing for even and efficient photoresist coating of extremely small and complex patterns. The unit also offers a variety of options, including a four-stage cooling tray and heated solvent tray, as well as spin coat, spray coat, and real-time monitoring of wafer temperature, pressure, and other variable conditions. 860F machine can support solvent processes such as Methylisobutylketone (MIBK) and 2-Methylisobutylketone (MIBK II) as well as high-solids systems such as polyimide, polyurethane, and silicon oxynitride solutions. The tool also offers advanced spraying technology, such as electrostatic, varying nozzle hole size, uniform flow, and low aerosol formation. This precision control allows for reliable coating of difficult to coat features, such as permeable contact layers, as well as for patterning small features and circuit structures, such as SRAM memory cells. Additionally, SEMITOOL 860F features a low k-value dispenser for improved process uniformity, and its advanced controls allow for easy process optimization. The asset also supports feature sizes from 0.18um to 5um, eliminating the need for manual mask alignment. 860F boasts safety features such as two-stage baking ovens, adjustable gas purges, and Low-ESD construction, making it a reliable and secure photoresist process tool. In summary, SEMITOOL 860F is a robust photoresist model designed to allow for cost-effective, reliable and high-resolution patterning of complex patterns and delicate features, suitable for the most advanced semiconductor manufacturing processes.
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