Used SEMITOOL 870F #9268556 for sale

Manufacturer
SEMITOOL
Model
870F
ID: 9268556
Spin Rinse Dryer (SRD) Dual stack With upgraded THORNTON controller.
SEMITOOL 870F is a photoresist equipment designed for processing semiconductor wafers in a chemical environment. It is equipped with an advanced, further improved version of the ultra-lithographic NanoFlex™ technology. 870F is a fully automated, precise solution for patterning semiconductor materials. It provides excellent patterns quality and clean zone uniformity through an integrated process temperature control system. With the capability to process up to 200mm diameter wafers, it enables rapid and accurate substrate patterning, from 2um to 50um. SEMITOOL 870F offers an integrated, high cost effectiveness pre-aligner module. This unit monitors the wafer position and stage alignment in the pre-aligner, to ensure quick and precise substrate patterning. It also enables rapid loads and unloads of substrate from the exposure chamber. 870F photoresist machine uses two lightsources for exposure processes. The Cadax VCP 30 is equipped with 3kW and 6kW Xenon lamps, which allow the tool to have flexibility in exposure process. This allows the customer to adjust the exposure time for the most challenging processes in semiconductor market. The NanoFlex™ technology, used in SEMITOOL 870F, allows for precise DUV light patterning and is capable of delivering the fine linewidth results that are required for advanced semiconductor processes. It has a UV source with wide wavelength range and the laser illumination asset which enables for light patterning without unnecessary exposure to outside light. 870F is designed to be used in a Class 10 cleanroom environment, according to the cleanroom rating standards. It has an innovative rear opening access panel and is made of epoxy and stainless steel, and other components that are resistant to corrosion. It includes a protective fume extraction duct and complies with EPA and OSHA emission standards. SEMITOOL 870F is an advanced, robust photoresist model, which is specifically built for semiconductor processing. It gives customers a reliable, high-quality substrate patterning equipment, with a rapid turnaround time for fast and efficient results.
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