Used SEMITOOL / CALOGIC ST-870 #9265369 for sale

SEMITOOL / CALOGIC ST-870 is a top-of-the-line photoresist equipment designed for the advanced treatment of silicon wafers. It uses a high-powered UV stepper to expose patterns onto the wafer, which can then be transferred to the surface using specialized liquids and processes. CALOGIC ST-870 is capable of producing very accurate images, enabling it to play an essential role in the development of complex and intricate devices and circuits. SEMITOOL ST-870's system design is based around a 5-axis scan table, which is capable of both high- and low-speed scanning of up to 300 wafers simultaneously. It also features a series of advanced beam alignment monitors, which helps ensure the stepper is correctly positioned before each exposure. This helps to ensure the highest level of accuracy for even the most complex images. ST-870 utilizes advanced scanning algorithms to improve the fidelity of pattern printing, allowing greater levels of feature detail and greater uniformity of coverage. This technology also helps to minimize the amount of time required to expose the entire wafer, increasing productivity. To achieve the highest levels of cleanliness, SEMITOOL / CALOGIC ST-870 features a range of features designed to limit particulate contamination. It has a proven ability to effectively control the humidity level, while also offering excellent solvent containment and on-site chemical recycling features. Its automatic cleaning process is also exceptionally capable, further helping to keep the unit running at peak performance. Beyond its imaging capabilities, CALOGIC ST-870 also features a full suite of metrology and quality assurance functions. These include automated defect inspection and review, as well as the ability to quickly and accurately generate test structures for faster yield assessment and troubleshooting. In summary, SEMITOOL ST-870 is an advanced photoresist machine designed for high-precision device manufacturing. It combines a series of advanced optics and scanning algorithms with a range of cleanroom and metrology features to make the imaging process faster, cleaner, and more accurate than ever before.