Used SEMITOOL CD-E1/750 #159333 for sale

SEMITOOL CD-E1/750
Manufacturer
SEMITOOL
Model
CD-E1/750
ID: 159333
Chiller box.
SEMITOOL CD-E1/750 is a performant photoresist equipment designed to optimize the ashing, spinning and drying cycles in the production of photomasks. It follows the rigorous specifications and requirements of advanced semiconductor processes. The system features several stages of automated processes such as atmospheric pressure chamber (APC) ashing, chemo-mechanical planarization (CMP) polishing, and spin-coat deposition. The photoresist unit incorporates advanced control technology, including pre-programmed cassette cycling and efficient recipe development. The atmosphere within the chamber is constantly purged with nitrogen, avoiding any contamination by oxygen or water. The machine is equipped with advanced electrostatic discharge (ESD) protection capabilities and can be utilized in both Class 1000 and Class 10,000 cleanroom environments to ensure total electrostatic safety. SEMITOOL CD-E1/750 photoresist tool is designed to give superior performance, excellent homogeneity and high quality results. It is capable of providing high deposition accuracy (accurate to the level of nanometers) across the entire substrate. Additionally, it boasts high throughput rate and quick ashing performance. The asset has also been proven to strongly reduce chemical consumption, waste and process time. Furthermore, the model offers a user-friendly interface that allows for accurate monitoring, control and reporting on all process steps. The data logging and analysis capabilities enable close attention to the results of each batch, and the adjustable clamps and spin-stops allow for the easy adaptation and customization of each process. Overall, SEMITOOL CD-E1/750 Photoresist Equipment is a reliable, highly efficient and user-friendly choice for every semiconductor manufacturing process. It is also built to meet all stringent standards, allowing for an optimal ashing, spinning and drying performance in the production of photomasks.
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