Used SEMITOOL CP04MNSPD0801 #9158970 for sale

SEMITOOL CP04MNSPD0801 is a photoresist Coater/Developer equipment designed for the mask fabrication process in the semiconductor industry. The system consists of a single-wafer chamber able to process 200mm wafers, multiple nozzles for precise volume control, integrated micro-processor controls, and an intuitive user interface. SEMITOOL CP 04 MNSPD 0801 uses up to 6 process modules to manage photoresist development, adhesion, stripping, and drying processes. Its wafer handling mechanism is robust and reliable, allowing the operator to quickly and accurately adjust the loading and unloading of wafers. The chamber of CP04MNSPD0801 is capable of a vacuum pressure as low as 1 Torr and a temperature up to 65 degrees Celsius. An integrated vacuum unit maintains the required pressure for optimal resist coating or development. The integrated microprocessor is used to control the process modules, accurately adjusting the deposition and development parameters for each individual wafer. The pressure, temperature, and mechanical components of the chamber are monitored to ensure they stay within the specified range throughout the processing of each wafer. The nozzles of CP 04 MNSPD 0801 are designed for precise volume control during the coating and development of photoresist. By carefully adjusting the nozzles, photoresist films of consistent thickness and uniformity can be created on the wafer surface. The integrated user interface allows the operator to easily and quickly select the desired parameters for coating and developing a given wafer. This ensures each wafer is coated and developed with the same uniformity and quality. SEMITOOL CP04MNSPD0801 is an advanced photoresist Coater/Developer machine designed for rapid and accurate resist coating and development on multiple wafers. Its robust and reliable chamber design allows for uniform deposition and precise control of the process modules. Its integrated microprocessor and user interface ensure the operator can reliably adjust the desired parameters of the wafer process. With its ability to maintain optimal vacuum pressure and temperature, SEMITOOL CP 04 MNSPD 0801 is capable of providing reliable and repeatable wafer processing for high-volume photoresist coating and development.