Used SEMITOOL CP04MNSPD0801 #9289501 for sale

SEMITOOL CP04MNSPD0801 is a high-precision photoresist equipment designed for microelectronic device fabrication. The system removes material from a substrate such as silicon wafers to create microscopic patterns. It is designed for use in cleanroom environments, and includes several advanced features for handling and processing wafers. The unit is equipped with a fully automated front-end loader and unloader machine for rapid and precise loading and unloading of wafers. In addition, the tool includes a 50-inch spin slit for accurate coating in high-resolution applications. In addition, SEMITOOL CP 04 MNSPD 0801 features a reactive gas purge asset for removing residual volatile compounds and particles from the model. This advanced equipment also includes a closed-loop recirculation system for removing ionic impurities from the exposed wafers. Another advantage of this unit is the included integrated diagnostics suite. This feature provides diagnostics capabilities such as temperature, air flow, vacuum, and pressure monitoring. It also supports the tracking of multiple operations, ensuring that all processes are carried out accurately and within specified parameters. The machine also includes real-time control and autodiagnostics, providing a high level of assurance that all operations are completed correctly. CP04MNSPD0801 is a sophisticated photoresist tool designed to perform precise, reliable, and consistent fabrication of devices in a cleanroom environment. It offers robust features for handling and processing wafers, as well as integrated diagnostic capabilities and real-time monitoring. In addition, its advanced purge and recirculation systems ensure that all operations are completed with a high degree of accuracy, making it an excellent choice for those in the microelectronics field.