Used SEMITOOL Equinox #293619018 for sale
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ID: 293619018
Wafer Size: 8"
Vintage: 1999
Electroplating system, 8"
P/N: EQ626PRCUPLTNG200
ADE Series 350 Robot arm controller
(4) Plating chambers
(5) Preclean / SRD Chambers
Cupric Sulfate / Copper Cu exposed
1999 vintage.
SEMITOOL Equinox is an automated photoresist equipment designed to enable material deposition and pattern definition of substrates with accuracy and repeatability. It offers an integrated, automated process for developing aerosol deposited photoresists, photomask and substrate alignment, coating, exposure, and development for semiconductor processing. Equinox features a single platform for both manual and automated processes. The platform includes an independent chamber for coating, a mini-radiant exposure system, and a chamber for developer over spray and a submerged processing station. To ensure the accurate alignment of substrates and photomasks, a built-in automatic hardstop unit and substrate holder allow for precise overlap of the two components. The unit also features a CCD electronic alignment machine, an integrated minipositor for accurate and repeatable pattern definition, and a temperature-controlled aerosol deposition chamber, which ensures proper and consistent coating. SEMITOOL Equinox utilizes proprietary software to control its automated processes. As part of the automated process, developers are injected into the submerged station to etch the exposed photoresist. The optimized filtration tool is designed to capture the developer particles produced in the process. Equinox can be used with a range of photoresists, including positive and negative photoresists, and positive and negative tone resists. Additionally, the asset can accommodate substrates up to 200mm in capacity, with thickness up to 3mm. SEMITOOL Equinox is an ideal solution for semiconductor manufacturers looking for an automated photoresist model to deliver accurate pattern definition for their devices. With its integrated single platform and automated processes, this equipment can help to maximize process repeatability and yield, while reducing cycle time.
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