Used SEMITOOL Equinox #293659794 for sale
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ID: 293659794
Vintage: 2007
Electroplating system
Package: Plastic wrap
Dimensions: (L)1190 mm x (W) 775 mm x (H) 1235 mm
Dry film dimension:
Film width: 150~640 m/m
Membrane diameter: ≤ 4250 mm
Feeding section:
31.5 m/m, P= 76 m/m
Roller: Aluminium
Size (cm): 190 x 160 x 192
Temperature control: PID type S.S.R drive
Manual feeder
Temperature range: 120°C
Power supply: AC 220 V 1φ, 50/60 Hz, 3.5kVA
2007 vintage.
SEMITOOL Equinox is a photoresist equipment designed for advanced lithography processes. Designed specifically for micro-fabrication processes, Equinox is a state-of-the-art system that can be used to manufacture highly precise semiconductor components. SEMITOOL Equinox features the latest technology, including a user-friendly touchscreen interface with an easy-to-understand menu unit. This machine is capable of rapid, automated processing, allowing for faster fabrication times while still maintaining an ultraclean environment necessary for accurate lithography results. Equinox also offers a range of capabilities including substrate preprocessing, double-side coating, adhesive bonding, resist and bottom anti-reflective coating, spin-coat processing, soft bake, spin-develop, etch, stripping, and CMP (Chemical Mechanical Polishing). The photoresist tool is highly efficient and requires minimal maintenance. Its low-cost equipment and efficient build structures ensure that the cost of fabrication remains low. Furthermore, the asset is designed to facilitate rapid processing and laboratory automation, which is especially beneficial for smaller production batches. SEMITOOL Equinox photoresist model also supports a wide range of substrates including metal, thin-film, thick-film, polyimide, and organic substrates. Additionally, the resist and substrate materials are stored in an integrated storage equipment, making it easy and convenient to access them. In addition to substrate, resist, and cleaning functions, Equinox also features a real-time automatic alignment camera that can quickly adjust the top-side or bottom-side alignment based on wafer shape or substrate type. This is achieved through the combination of a top-mounted back surface optical illumination camera and its advanced software algorithms. Overall, SEMITOOL Equinox photoresist system is an innovative and advanced lithography unit designed to support the micro-fabrication processes of semiconductor components. With its specialized functions, ease of use, and cost-effectiveness, this machine can facilitate the production of high-precision components and products.
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