Used SEMITOOL Equinox #293797045 for sale

Manufacturer
SEMITOOL
Model
Equinox
ID: 293797045
Wafer Size: 6"
Vintage: 2010
Electroplating system, 6" (2) Chambers Stainless steel cabinet TEFLON Chemical process chamber, 8" SS Low pressure chemical process chamber, 8" (4) Tanks GENMARK Wafer handling robot Wafer handler, 6" Flowmeter Touchscreen Controller CO2 Fire suppression system 3-Color signal tower Manuals included.
SEMITOOL Equinox is a photoresist equipment designed to increase the productivity of photolithography processes. It is designed to simplify the load/unload process, reduce manual intervention, and provide cleanroom compatibility. It provides a compact and cost-effective tool that is ideal for use in advanced semiconductor and MEMS fabs. Equinox features an innovative Dual Platen Transport System (DPTS). This unit enables simultaneous loading and unloading of workpieces, which reduces turnaround time and dramatically increases throughput. The machine also features fully automated substrate and adapter handling, which eliminates manual intervention. The tool is also cleanroom compatible and features state-of-the-art design elements to reduce particle contamination. These design elements include dynamic particle isolation between the wafer chambers, sealed wafer transfer conveyors, and gas bubbled wafer carriers. Additionally, the tool is equipped with an integrated Controlled Enclosure Module (CEM), which creates a closed environment that prevents contamination and allows for cleanroom operation without additional air filtration. SEMITOOL Equinox also has a user-friendly LCD touch screen interface. Its intuitive menu structure ensures easy operation and offers more flexibility than standard consoles. The tool comes equipped with an extensive library of standard recipes, including optimized processes for different materials. Equinox provides the ideal solution for semiconductor and MEMS fabrication needs. It offers high productivity, excellent cleanroom compatibility, user-friendly operation, and flexible process controls. It is therefore an ideal tool for photolithography processes in advanced fabs.
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