Used SEMITOOL Equinox #9207969 for sale

Manufacturer
SEMITOOL
Model
Equinox
ID: 9207969
Wafer Size: 6"
Plating system, 6" (3) Plating chambers Heated plating tank Tank ultrasonic level sensor (2) Sample ports ARU Interface Tank heat exchange connections Flow schematics Operations manual Power: 208 VAC, 80 A, 50/60 Hz.
SEMITOOL Equinox is a high-precision photoresist processing equipment designed for semiconductor wafer processing. It is designed to provide reliable and precise deposition of photoresist onto wafers to enable the production of sub-micron scale circuit designs for high-performance microelectronics devices. Equinox system is designed for high-precision and repeatable photoresist coating. It utilizes a patented pre-treatment technique to ensure excellent adhesion and uniformity of photoresist deposition. The unit includes a dry chemical sprayer to prepare photoresist surfaces, a spin-coater to deposit photoresist, and a specialized low-temperature post-pour bake which helps to properly fix the photoresist layer to the wafer. SEMITOOL Equinox machine also features automated endpoint detection capabilities to provide accurate results when depositing multiple photoresist layers with varying thicknesses. It has multiple temperature control modes including oxy-nitrogen, nitrogen, silent argon, and high-pressure dry exhaust. This allows for more precise control of the coating process, which is essential for producing high-quality photoresist layers at various thicknesses. Equinox tool has built-in safety protocols to provide consistent and reliable performance and prevent the asset from becoming overloaded or damaged. It features a sophisticated Dense Sublimation model which ensures uniform and repeatable deposits from one layer to another. It also has a Contamination Free Environment which eliminates the introduction of static and aerosol contamination so that subsequent device layers remain clean and free of defects. SEMITOOL Equinox has a wide range of process capabilities and can easily handle various photoresist types such as SU-8, AZ, BISMOC, PMMA, and more. It is designed to process up to 25 wafers per hour and provides exceptional process control and reliability for extended photoresist deposition times. It features a unique Multi-Point Spin-Coat method which guarantees uniform, repeatable process performance. Overall, Equinox is a high-precision photoresist processing equipment designed to provide accurate and repeatable photoresist deposition for semiconductor wafer processing. It has a range of advanced features and process capabilities to ensure rapid, efficient, and reliable photoresist coating for high-performance microelectronics devices.
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