Used SEMITOOL Equinox #9229811 for sale

SEMITOOL Equinox is a high-performance, multi-chamber photoresist equipment specifically designed for plasma etch, PVD, strip and cleaning processes. It has been developed to meet the needs of the cutting-edge microelectronics industry and provides superior thin-film processing capabilities to enable manufacturers to remain competitive. Equinox is a fully integrated system that enables ultra fine feature fabrication, making it ideal for advanced photo- and MEMS-device fabrication techniques. It features three independent process chambers with a combined capacity of 1,000 liters. The chambers can operate at a pressure range of 0.25 to 50 torr and temperatures up to 300°C. Each chamber can be fitted with various combination of slot and pin photomasks, slit masks, and shadow-processed plates enabling precise patterning for all thin-film, etch, and Strip processes. The three independent process chambers work in tandem with the specifically designed SEMITOOL Equinox Process Control Unit*. This intelligent machine can monitor each chamber individually and make real-time process adjustments as needed. In addition, Equinox Process Control Tool can perform asset diagnostics, wafer tracking, recipe control and statistical process control to ensure optimum efficiency and performance. SEMITOOL Equinox is equipped with a unique multi-level end-point detection model that allows the operator to monitor and control the process during exposure to plasma etch, PVD and wet etch operations. With the multi-level end-point detection equipment, manufacturers are able to accurately monitor the etch profile and determine when the desired results have been achieved. Equinox provides superior photoresist system performance and unmatched quality control. This advanced unit simplifies the fabrication process, allowing manufacturers to create complex structures with superior accuracy and speed. With its small footprint, flexible design, and comprehensive process control capabilities, SEMITOOL Equinox is the ideal choice for precise and efficient photoresist processing.