Used SEMITOOL Equinox #9377488 for sale

SEMITOOL Equinox is an advanced photoresist equipment designed to provide precision, repeatability, and quality in the production of semiconductor and other nanoscale devices. The system consists of a series of steps that develop a thin film of photoresist over a substrate that has been polished to a smooth finish. The unit provides an environmental chamber that ensures the photoresist is uniformly applied over the entire wafer. The machine also includes an integrated wafer scan tool that measures wafer thickness, allows for on-site control and monitoring of the photoresist thickness, and automatically adjusts the photoresist layer thickness as necessary. The photoresist layers are then exposed with ultraviolet (UV) light, the intensity of which can be precisely controlled and monitored. The UV exposure causes the photoresist to form a pattern on the wafer. A post-exposure bake step is then performed to cook off any remaining solvent and harden the photoresist for additional processes such as etching, deposition, and lithography. The photo etch process is a critical step to ensure that the photoresist pattern created is perfectly replicated down to the nanometer level. Equinox includes an on-board etch process used to etch the photoresist pattern in the wafer. This machine also allows fine-tuning of the etch process to achieve a higher degree of precision and accuracy. Additionally, the asset is designed to provide high temperature uniformity during all stages of the photoresist process. This ensures a uniform deposition of the photoresist layers, prevents deviation in the etch profile, and allows each sample to have the exact same characteristics, even if slightly different from one wafer to another. In a nutshell, SEMITOOL Equinox is a powerful photoresist model that can be used to develop nanoscale devices with a high degree of precision. It includes a number of integrated systems to ensure uniform photoresist layers, precise and accurate etching, and uniform high temperature during all stages of the process. The equipment also provides an on-board wafer scan system to enable real-time monitoring and control.