Used SEMITOOL Millennium #9207932 for sale

SEMITOOL Millennium is a photoresist equipment designed to meet the high-precision demands of the semiconductor industry. It is capable of producing very thin and highly uniform etched patterns on semiconductors for a variety of purposes, from creating deep vias to forming extremely fine lines and other shapes. The system utilizes a chemically inhibited process to ensure a low number of defects and a high consistency of the etched patterns, even at varying substrates and process conditions. This unit is highly versatile and can be adjusted for a wide variety of substrates and photoresists to best fit the needs of the customer. Millennium employs a three-stage approach to the photoresist etching process. The first stage consists of a photoresist coating process to create a thin, uniform resist layer on the substrate's surface. Second, profilometry is used to determine the desired etch depth. This information is then fed to the third stage: a specialized, computer-controlled etching machine which does the actual photoresist patterning. All three stages are designed to provide the highest resolution, most uniform etch patterns possible. SEMITOOL Millennium tool is also equipped with a range of tools to ensure the accuracy and uniformity of the etch process. These tools include an automated feature recognition (AFR) asset which ensures that the process is optimized in each step. This model saves time and eliminates discrepancies between the etch process and the desired patterns. Additionally, the equipment has a high-resolution (HR) tool, which allows highly accurate measurements of the etch depth. This is particularly useful in cases where etch depths of up to 50 microns need to be achieved. Finally, the system also has a fault detection unit, which allows it to detect potential errors, such as improper loading of the photoresist, that could lead to etch failures. In conclusion, Millennium is an advanced photoresist machine that is designed to meet the exacting demands of the semiconductor industry. It utilizes a chemically inhibited etching process for uniform and defect-free etching at varying substrates and process conditions, and tools to ensure the highest degree of accuracy and uniformity. Furthermore, it is highly versatile and can be customized to fit the customer's needs.