Used SEMITOOL N27SF7L8WP-100-00000 #293665317 for sale

ID: 293665317
Wafer Size: 6"
Vintage: 2010
Spin Rinse Dryer (SRD), 6" 2010 vintage.
SEMITOOL N27SF7L8WP-100-00000 is an advanced photoresist equipment designed for high-quality precision lithography. The system is a single-wafer platform that includes a fully automated multi-user optical imaging unit, an enclosed chemical processing chamber, and an integrated wastewater treatment machine. N27SF7L8WP-100-00000 is built for flexibility, as the multi-user optical imaging tool allows for a wide variety of user applications, such as masking, multi-patterning, or contact lithography. The asset utilizes an advanced photoresist processing model that includes an automatic load lock mechanism, chemical spray equipment, and spin processor. This allows for precise processing of the photoresist substrate, ensuring the quality of the lithography pattern. The system includes a variable intensity imaging source for optimum exposure at different angles, variable focus for advanced alignment, and programmable event marker for automated choreography. Additionally, SEMITOOL N27SF7L8WP-100-00000's advanced optical imaging unit enables the user to image with either contact lenses or projection optics, and is capable of variable contrast imaging, allowing for precise fingerprinting. The integrated chemical processing chamber includes a three-way isolation valve machine, as well as an automated wastewater treatment tool, to accurately monitor and control the discharge of residual chemicals and wastewater. The automated asset utilizes advanced software for controlling and monitoring the wastewater treatment process, as well as integrated diagnostics. Additionally, the model is designed to be easily reconfigurable for different applications, as well as for easy maintenance. Overall, N27SF7L8WP-100-00000 is an advanced photoresist equipment that offers precision lithography and flexibility in user applications. Its integrated chemical processing and wastewater treatment chambers ensure precise processing and control of residual chemicals and wastewater. The system's advanced optical imaging features, such as variable intensity imaging source and focus, allow for precise finger printing and accurate alignment. Additionally, the unit is designed for easy reconfiguration and maintenance to ensure it remains an effective tool for a variety of applications.
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