Used SEMITOOL / OEM SAT 2081D2PCCU #9400645 for sale

SEMITOOL / OEM SAT 2081D2PCCU is a photoresist equipment specifically designed for advanced semiconductor fabrication. The system combines a light source, process chamber and temperature control systems in a single solution. It also features a light-emitting array (LEA) in the processing chamber that allows for improved light coverage over wide substrates. The light source is based on a direct-coupled light emitting diode (LED) array which produces a high- intensity, narrow-spectrum, UV irradiation (from 250 - 405nm), while maintaining a temperature profile as low as 149°C. This ensures that materials are treated evenly and uniformly. Additionally, the light spot size can be adjusted to accommodate substrates of different sizes. The process chamber is sealed and pressurized, with an integrated heat exchanger to maintain uniform substrate temperatures. This chamber is also equipped with a vacuum element, allowing for the use of inert gas to create atmosphere-free processing environments. The temperature control unit consists of three independent temperature control elements: a ceramic heater, an electrically heated plate (EHP) and a hot plate. The ceramic heater maintains the desired temperature of the substrate, while the EHP and hot plate are used to control the temperature profile of the process chamber. OEM SAT 2081D2PCCU photoresist machine is designed for ultrafast processing, with a maximum cycle time of two seconds. It also features anti-reflection technology and advanced substrate handling, making it well-suited for the creation of intricate devices. The tool's flexible power setting and secure advance light shielding provide uniform exposure of substrates, reducing misprocessing due to edge effects. Additionally, the asset features superior repeatability and overall performance, making it highly reliable even in the most stringent of industrial conditions. Overall, SEMITOOL SAT 2081D2PCCU is a well-engineered photoresist model specifically designed for fast and precise semiconductor fabrication. It provides reliable performance while effectively managing temperature variations in the processing environment. It is able to handle a range of substrates, making it an ideal choice for advanced semiconductor device production.