Used SEMITOOL / OEM SAT 2081D2PCCU #9400646 for sale

ID: 9400646
Wafer Size: 8"
Vintage: 1997
Spray acid tool, 8" (2) Chambers Non-functional main power distribution board 1997 vintage.
SEMITOOL / OEM SAT 2081D2PCCU is a photoresist equipment designed for use in a variety of semiconductor manufacturing processes. The system consists of a high-precision and high-vacuum thin film deposition source, a reaction tube, and a high-vacuum process chamber. The thin film deposition source is a 6-axis, fast pulsed-dc electron gun designed to deposit various metals and insulators, such as titanium nitride, directly onto the wafer surface. It is also capable of depositing other materials, such as silicon dioxide, into the substrate. The reaction tube is a rotary-type device that circulates a photoresist solution at a high flow rate. This process is used to convert specific portions of the substrate into photoresist masks. The process chamber is a large, stainless-steel vacuum chamber that houses the thin-film deposition source and the reaction tube. It is capable of maintaining a vacuum level in the 10-7 to 10-8 Torr range. In addition to the hardware components, the unit includes a proprietary software package that enables the user to create recipes tailored to the specific deposition and photoresist processes. The recipes allow for precise control of the machine parameters, such as the thickness of the deposited material, the rate at which the photoresist is flowing through the reaction tube, the angle at which the thin film deposition source is positioned, and the vacuum pressure in the process chamber. The tool is designed for batch processing and is suitable for semiconductor manufacturers of all sizes. It offers high throughput, excellent process control, and significant savings in cost and time. In addition, the asset is very reliable, with mean time between failure rates above 99.9%. This ensures the safety and efficiency of each process and eliminates the need for frequent maintenance. OEM SAT 2081D2PCCU is a robust, cost-effective photoresist model ideal for a variety of semiconductor manufacturing processes. Its wide variety of features and capabilities make it a premier choice for clients looking to streamline their photolithography processes.
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