Used SEMITOOL PSC-101 #293600518 for sale

Manufacturer
SEMITOOL
Model
PSC-101
ID: 293600518
Wafer Size: 6"
Spin dryer, 6" M/N: 270S-3-1-E-ML.
SEMITOOL PSC-101 is a photoresist equipment developed by SEMITOOL, Inc. This system is designed to enable manufacturers to quickly and accurately manufacture products with a high degree of precision and quality. The unit's main components include: a cleanroom-controlled process chamber, an automated substrate transfer robot, and a spray robot. The process chamber is designed to provide a clean and sterile environment for photoresist processing and features integrated auto-mated processes that enable quick and reliable substrate development. The automated substrate transfer robot transports wafers from the input to the output in a safe and controlled manner. Finally, the spray robot is equipped with a highly accurate nozzle machine that ensures a uniform application of photoresist on the substrate. The tool can handle a wide variety of substrates, including silicon wafers, glass, quartz and polyimide. It also provides several different coatings, such as polyimide Parylene, polyimide Fertanol, polyimide polyamide, polyimide SiLK, polyimide BN and polyimide Acrylic. A wide range of photoresists can be used with the asset, including DryFilm Autoloader, Resist Type III (Type TX-1), DryFilm AP300 and Resist Exposure Kit. In addition, this model can be used with a variety of lasers for photoresist hypersensitivity. SEMITOOL PSC 101's process chamber is equipped with several features to increase accuracy. These include: a rapid thermal processing equipment, a temperature-controlled chamber, a dual substrate heater, a uniformity control system and a process monitor. The rapid thermal processing unit can create high quality sprays with a minimum number of cycles, reducing cycle times and increasing efficiency. The temperature-controlled chamber enables users to control the chamber's temperature from 0-500 degrees Celsius, allowing for accurate and repeatable results. The dual substrate heater keeps substrates at the same temperature during processing, while the uniformity control machine ensures uniform exposure. Finally, the process monitor allows the user to monitor the photoresist exposure process, enabling manufacturers to quickly diagnose and address any potential problems. PSC-101 is an ideal tool for photoresist manufacturers looking to increase accuracy and reduce cycle times. With its automated processes, cleanroom-controlled processes, and wide range of compatible photoresists, this tool is a reliable and efficient tool that can improve quality and reduce costs.
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