Used SEMITOOL PSC-101 #293725377 for sale

SEMITOOL PSC-101 Photoresist Equipment is a precision coating tool designed for the photolithography applications. The system offers a wide range of features and capabilities, allowing the user to accurately and consistently coat the photoresist resists onto the semiconductor wafer. The main components of the unit are the body, the power module, the process controller, the nozzle, and the mask plates. The body of the machine includes the drive motor and transmission, the support peg tool and the pressure-feed mechanisms. The power module controls the speed and power requirements of the drive and handle the supply of the electrical connector. The process controller controls everything from the power settings to the cook settings, including the distribution of the photoresists and the cook and cool parameters. The nozzle then distributes the photoresist on the surface of the wafer. Finally, the mask plates are used to ensure accurate alignment of the photoresist layers to the substrate. The photoresist process can be conducted in two ways, the first being the use of the rotating wafer stage and the second being the use of a mask plate. The rotating wafer stage utilizes a vacuum chuck to hold a wafer into place and a turntable to spin the wafer. This allows the user to rotate the wafer so that they can accurately and uniformly coat the photoresists onto the surface. The mask plate technique is used to create a uniform coating on each side of the wafer while avoiding any overlap between the layers. The controller of SEMITOOL PSC 101 Photoresist Asset has a variety of features and settings. It can be programmed to accurately control the application of the photoresists, including the process time, current, temperature, and pressure. The controller also has an easy-to-read interface which allows the user to adjust and track settings at a glance. In addition, the model offers an automatic compensation feature which automatically shifts parameters according to any changes in the temperature, humidity, or pressure. PSC-101 Photoresist Equipment is a convenient, efficient and accurate tool for photolithography processes. It is designed to be user-friendly, offering a wide range of features and settings, and to be able to quickly and accurately coat photoresists onto the semiconductor wafer, saving time and money.