Used SEMITOOL PSC-101 #293746635 for sale

SEMITOOL PSC-101 Photoresist Equipment is a chemical wet bench designed for the handling, developing and stripping of photoresists and photoresist solutions for semiconductor devices. SEMITOOL PSC 101 features single-tank immersion capabilities with a chemical delivery system that has been designed with high-precision and low-volume-dispense capabilities. It is equipped with two maintenance-free and temperature-controlled heaters to provide optimal etching, resist stripping and chemical-solution-film-properties management while surpassing the requirements of multiple IC processing protocols. All processes are user-programmable, enabling control of all related variables such as pressure, temperature, flow rate and total process duration. PSC-101 also features a dual-drain unit with acid and DI tank support as well as a metal-(magnetic-)particle-filtration machine for the automated removal of metal oxide particles and other contaminates, reducing waste and processing cost. Able to handle substrates up to a size of 8" in diameter, PSC 101 is a compact, flexible machine that can be easily integrated into existing photomask, wafer and mask fabrication systems. SEMITOOL PSC-101 is highly programmable and offers upgradeability, allowing users to tailor the tool to the exact requirements of their application. SEMITOOL PSC 101 is equipped with several sensors to continuously monitor the integrity of the asset and ensure a consistent processing of the photoresist. The model is also equipped with a powerful four-channel remote-control interface for connecting to external process-control systems. With an aqueous spray rinse-nozzle configuration, a liquid-level-indicator as well as a compound wafer-indexer, PSC-101 is capable of a range of processing techniques. In addition, the equipment is designed with a built-in safety system to protect both users and sensitive chemicals. PSC 101 offers a flexible and efficient solution for photoresist-synthesis and processing that can be easily adapted for the demands of advanced semiconductor applications such as pre-photonic blade fabrication, integrated photonic-device fabrication or micromachining. Its high-resolution processing-chamber, precise chemical-dosing unit and compatibility with multiple external process-control systems make it an ideal choice.