Used SEMITOOL PSC-101 #9173289 for sale

SEMITOOL PSC-101 Photoresist Equipment is an automated, full-featured wet processing system designed for photoresist operations. It is a modular-style unit with a wide variety of capabilities. It consists of a main body, which houses the different equipment components, and the autoloaders, which are used to load substrates into the machine. The photoresist tool consists of several distinct processes for developing and depositing photoresist material, including pre-treat, resist coat, post-exposure bake, develop, and strip/rinse processes. The individual components are designed to provide optimum performance for each of these steps. The pre-treatment process includes PECVD, where the substrate is oxidized, while the resist coat process is designed to uniformly apply photoresist to the substrate. The post-exposure bake process is designed to harden the photoresist and evaporate the solvents, while the develop process utilizes either a hot-spray or electroless method to remove non-exposed photoresist. The strip/rinse process then removes the remaining photoresist from the wafer. The Photoresist Asset is controlled using SEMITOOL Printing Model Interface (PSI) software. The operation of the equipment is fully automated through the PSI software allowing for precision, uniformity, and repeatability in all processes. In addition to the autoloader capability, the system can also be set up with a variety of manual processes such as substrate loading and manual resist adjustment. The Photoresist Unit is designed to be easy to operate, maintain, and upgrade. The connectivity feature and remote I/O capability allows remote operation, real-time monitoring, and machine diagnostics. The machine is also designed for minimal downtime with several options for preventive maintenance, including automatic shutoff of the resist quench if the mag track goes out of tolerance. Overall, SEMITOOL PSC 101 Photoresist Tool is a highly efficient, automated wet processing asset designed to provide high quality photoresist processes with accuracy, repeatability, and minimal downtime. Its features such as connectivity, remote I/O capability, and preventive maintenance options make it an ideal choice for semiconductor device manufacturing, research, and other photoresist operations.