Used SEMITOOL PSC-102 #293820424 for sale
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SEMITOOL PSC-102 photoresist equipment is a high-performance processing system designed to provide precise defect-free photoresist coating and development for a variety of wafer applications. The unit is equipped with advanced touch-screen controls which make the machine easy to operate and program. It is capable of providing users with precise temperature and humidity control, as well as precise spin speeds, timer controls, and dip-coating abilities. Additionally, the tool is equipped with a powerful process monitoring asset that is capable of checking for resist film uniformity as well as other critical resist parameters such as thickness. SEMITOOL PSC 102 model is also equipped with a Resist Stripper Module (RSM) used for both wafer surface cleaning and photoresist removal. The RSM consists of an ultrasonic cleaning chamber, a substrate processor and a dry fan table. The ultrasonic chamber is used to ensure the removal of substrates and to ensure a proper surface cleanliness prior to coating photoresist on the wafers. The substrate processor is responsible for providing substrate and wafer cleaning, resist stripping and drying of the wafer. Finally, the dry fan table is designed to quickly releases any remaining resist and helps to avoid product waste and contamination. The equipment comes with several optional components, such as a powder delivery hopper, an air shower, a modular high speed spin station, and automated handling systems. The powder delivery hopper is used to store and dispense magnetoresistive and conventional photoresists. The air shower is used to provide an ambient and barrier environment for wafers to promote superior photoresist coating, development, and edge integrity. The modular high speed spin station offers additional flexibility by allowing for a low profile for wafers, ensuring high reliability and accuracy of the spin processes. The automated handling systems are custom-made to handle various types of photoresists, including conventional and modern advanced photoresist. Each automated system is designed with the utmost care to ensure reliable and safe operation. In short, PSC-102 photoresist unit is a high-performance processing solution that provides users with precise control and reliable performance. Its features and options provide users with a wide array of options and flexibility to meet their needs and requirements.
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