Used SEMITOOL PSC-102 #9400846 for sale

SEMITOOL PSC-102 is an advanced photoresist processing equipment designed for semiconductor wafer processing and other advanced photolithography applications. It is a fully automated, in-line system that offers superior process control, reduced downtime and increased process flexibility. The unit utilizes two major subsystems, the wet-etch chamber and the spin-coater chamber, to provide a complete photoresist processing environment. The wet-etch chamber of SEMITOOL PSC 102 uses a reactive solution to remove a photoresist layer from the substrate surface of a wafer. This is accomplished by a combination of mechanical and chemical stripping. The chamber houses a precision, programmable rotating platform that facilitates uniform rotation of the wafer, while precision nozzles dispense the etching solution. The ultraviolet LEDs in the chamber provide the necessary exposure to the photoresist layers and thus enable a higher resolution within the etched boundaries. The etching process is further enhanced through the use of programmable gas vents, which facilitates highly uniform etching over the entire surface of the wafer. The spin-coater chamber is designed for uniform deposition of a thin layer of photoresist over the surface of the wafer. The chamber houses a precision, motorized platform for even wafer rotation and is equipped with a liquid dispensing machine for accurate solution delivery. The spin-coater chamber is further equipped with a turbo pump unit and gas distribution tool for better control over the atmospheric environment and photoresist deposition. A digital camera and enhanced optics aide in the inspection of the process to help ensure optimal process results. PSC-102 is an advanced photoresist processing asset, providing an efficient and automated platform for photolithography and semiconductor manufacturing. It offers superior and reliable process control, reduced downtime and increased process flexibility to improve product yield. The model is ideal for advanced photolithography applications and is well-suited for both high volume and smaller run wafer processing needs.